Advanced CD AFM metrology for 3D critical shape and dimension control of photomask etch processing [6349-149]
- Author(s):
- Bao, T. ( Veeco Instruments Inc. (USA) )
- Zerrade, A. ( MP Mask Technology Ctr., LLC (USA) )
- Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 63493Z
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
Conference Proceedings
Advanced process control for poly-Si gate etching using integrated CD metrology
SPIE-The International Society for Optical Engineering |
3
Conference Proceedings
Advanced CD-AFM probe tip shape characterization for metrology accuracy and throughput
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Utilizing effective statistical process control limits for critical dimension metrology
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Improving dry etch control for contact plugs in advanced DRAM manufacturing
Society of Photo-optical Instrumentation Engineers |
10
Conference Proceedings
Atomic force metrology and 3D modeling of microtrenching in etched photomask features
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology
SPIE-The International Society for Optical Engineering |
11
Conference Proceedings
Atomic force metrology and 3D modeling of microtrenching in etched photomask features
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Simulation of critical dimension and profile metrology based on scatterometry method [6349-57]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Plasma etching of Cr photomasks: optimization of process conditions and CD control
SPIE-The International Society for Optical Engineering |