Distributed computing in mask data preparation for 45-nm node and below [6349-142]
- Author(s):
- Zhang, W.
- Sahouria, F.
- Schulze, S. ( Mentor Graphics Corp. (USA) )
- Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 63493T
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
2
Conference Proceedings
A user-programmable link between data preparation and mask manufacturing equipment
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Pattern based mask process correction: impact on data quality and mask writing time [5853-38]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Optimized distributed computing environment for mask data preparation [5992-41]
SPIE - The International Society of Optical Engineering |
6
Conference Proceedings
Required mask specification for mass production devices below 65-nm design node [6349-81]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |