Blank Cover Image

Evaluation of bi-layer TaSix absorber on buffer for EUV mask [6349-125]

Author(s):
Kanayama, K.
Tamura, S.
Nishiyama, Y.
Kawashita, M.
Matsuo, T.
Tamura, A.
Nagashige, S. ( Toppan Printing Co., Ltd. (Japan) )
Hiruma, K.
Goo, D.
Nishiyama, I. ( Association of Super-Advanced Electronics Technologies (Japan) )
5 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
63493A
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Optimization of TaSix absorber stack for EUV mask [6283-94]

Tamura, S., Kanayama, Y., Nishiyama, Y., Matsua, T., Tamura, A.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]

Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., …

SPIE - The International Society of Optical Engineering
2 Conference Proceedings Current status of Mo-Si multilayer formation in ASET for low-defect-density mask blanks for EUV lithography [6349-122]

Hiruma, K., Tanaka, Y., Miyagaki, S., Yamanashi, H., Nishiyama, I.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Dependence of pattern printability on thicknesses of absorber and cap layers of Mo/Si mask blank for EUV lithography

Sugawara, M., Chiba, A., Yamanashi, H., Nishiyama, I.

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Evaluation of defect repair of EUV mask absorber layer [5853-74]

Abe, T., Amano, T., Mohri, H., Hayashi, N., Tanaka, Y., Kumasaka, F., Nishiyama, I.

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Process development for EUV mask production [6349-131]

Abe, T., Fujii, A., Sasaki, S., Mohri, H., Hayashi, N., Shoki, T., Yamada, T., Nozawa, O., Ohkubo, R., Ushida, M.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography

Sugawara, M., Hashimoto, T., Nishiyama, I.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography

Fukuhara,N., Haraguchi,T., Kanayama,K., Matsuo,T., Takeuchi,S., Tomiyama,K., Saga,T., Hattori,Y., Ooshima,T., Otaki,M.

SPIE - The International Society for Optical Engineering
5 Conference Proceedings Evaluation of dry etching and defect repair of EUVL mask absorber layer

Abe, T., Amano, T., Motonaga, T., Sasaki, S., Mohri, H., Hayashi, N., Tanaka, Y., Nishiyama, I.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber

Tanaka, Y., Kim, D., Yamanashi, H., Nishiyama, I.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Resist evaluation for EUV application at ASET

D. Goo, Y. Tanaka, Y. Kikuchi, H. Oizumi, I. Nishiyama

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Materials for an attenuated phase-shifting mask in 157-nm lithography

Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M.

SPIE-The International Society for Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12