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Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking [6349-124]

Author(s):
Nataraju, M.
Sohn, J.
Mikkelson, A. R.
Turner, K. T.
Engelstad, R. L. ( Univ. of Wisconsin, Madison (USA) )
Van Peski, C. K. ( Sematech, Inc. (USA) )
1 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
2
Page(from):
634939
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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