Multi-layer resist system for 45-nm-node and beyond: Part II [6349-121]
- Author(s):
Fujimura, Y. Morimoto, J. Manoshiro, A. Shimizu, M. Takamizawa, H. ( Dai Nippon Printing Co., Ltd. (Japon) ) Hashimoto, M. Shiratori, H. Horii, K. Yokoya, Y. Ohkubo, Y. ( HOYA Corp. (Japan) ) Enomoto, T. Sakaguchi, T. Nagai, M. ( Nissan Chemical Industries (Japan) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 2
- Page(from):
- 634936
- Page(to):
- 634936
- Pages:
- 1
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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