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EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]

Author(s):
Kim, D. Y.
Cho, S. Y.
Kim, H.
Huh, S. M.
Chung, D. H.
Cha, B. C.
Lee, J. W.
Choi, S. W.
Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) )
Park, K. H.
Kim, E. J.
Guo, Z.
Quach, E.
Gee, D.
Brown, T.
10 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. date:
2006
Pt.:
2
Page(from):
63492L
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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