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Required mask specification for mass production devices below 65-nm design node [6349-81]

Author(s):
Nam, D.
Choi, S.
Doh, J.
Noh, Y.
Lee, H.
Sin, Y.
Kim, B.
Kang, M.
Han, W. ( Samsung Electronics Co., Ltd. (South Korea) )
4 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. date:
2006
Pt.:
1
Page(from):
634928
Page(to):
634928
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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