Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET [6349-78]
- Author(s):
- Nistler, J. L.
- Duckworth, K. ( PSIDA Lithography & Software LLC (USA) )
- Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 634925
- Page(to):
- 634925
- Pages:
- 1
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-ヲフm i-line
SPIE-The International Society for Optical Engineering |
8
Conference Proceedings
Proximity effect correction for the chemical shrink process of different type contact holes
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
4
Conference Proceedings
Process, design and optical proximity correction requirements for the 65nm device generation
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Correcting lithography hot spots during physical-design implementation [6349-73]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design
SPIE-The International Society for Optical Engineering |