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Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

Author(s):
Park, J.
Hsu, S.
Van Den Broeke, D.
Chen, J. F. ( ASML MaskTools (USA) )
Dusa, M.
Socha, R. ( ASML Technology Development Ctr. (USA) )
Finders, J.
Vleeming, B.
van Oosten, A.
Nikolsky, P. ( ASML Netherlands B.V. (Netherlands) )
Wiaux, V.
Hendrickx, E.
Bekaert, J.
Vandenberghe, G. ( IMEC vzw (Belgium) )
9 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
634922
Page(to):
634922
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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