High-transmission attenuated phase-shift mask for ArF immersion lithography [6349-68]
- Author(s):
- Kojima, Y.
- Mizoguchi, T.
- Haraguchi, T.
- Konishi, T.
- Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) )
- Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63491V
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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