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Advanced photomask repair technology for 65-nm lithography [6349-50]

Author(s):
Aramaki, F.
Kozakai, T.
Muramatsu, M.
Sugiyama, Y.
Koyama, Y.
Matsuda, O.
Suzuki, K.
Okabe, M.
Doi, T.
Hagiwara, R.
Adachi, T.
Yasaka, A. ( SII NanoTechnology Inc. (Japan) )
Tanaka, Y.
Suga, O ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Nishida, N.
10 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. date:
2006
Pt.:
1
Page(from):
63491E
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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