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Sensitivity of a variable threshold model toward process and modeling parameters [6349-44]

Author(s):
Saied, M. ( Freescale Semiconductor, Inc. (France) )
Foussadier, F. ( STMicroelectronics (France) )
Trouiller, Y. ( LETI-CEA (France) )
Belledent, J. ( Philips Semiconductors (France) )
Lucas, K. ( Freescale Semiconductor, Inc. (France) )
Schanen, I. ( IMEP (France) )
Borjon, A.
Couderc, C. ( Philips Semiconductors (France) )
Gardin, C. ( Freescale Semiconductor, Inc. (France) )
LeCam, L.
Rody, Y. ( Philips Semiconductors (France) )
Sundermann, F.
Urbani, J.-C. ( STMicroelectronics (France) )
Yesilada, E. ( Freescale Semiconductor, Inc. (France) )
9 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. Year:
2006
Pt.:
1
Page(from):
634919
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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