Study of the beam blur and its effect on the future mask fabrication [6349-33]
- Author(s):
Lee, S. Park, S. Ahn, M. Doh, J. Kim, S. Kim, B. Choi, S. Han, W. ( Samsung Electronics Co., Ltd. (South Korea) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63490X
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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