Design-based mask metrology hot spot classification and recipe making through random pattern recognition method [6349-24]

Design-based mask metrology hot spot classification and recipe making through random pattern recognition method [6349-24]

Author(s):

Cui, Y.
Baik, K.
Gleason, B.
Tavassoli, M. ( Intel Corp. (USA) )

Publication title:

Photomask Technology 2006

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6349

Pub. Year:

2006

Pt.:

1

Page(from):

63490O

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

Language:

English

Call no.:

P63600/6349

Type:

Conference Proceedings

Details

TDL ID:	ZA00016353
Series ID:	PA00000029
Conf. info. (Name):	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
Conf. info. (Number):	2006 : 26th
Conf. info. (Venue):	Monterey, CA, USA
Conf. info. (Date):	2006.09.19-2006.09.22

Similar Items:

1 Conference Proceedings Contact hole CD and profile metrology of binary and phase-shift masks: effect of modeling strategies in application of scafferometery [6349-22] Lee, K., Yedur, S., Tavassoli, M., Baik, K., Tabet, M. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Comparison study of mask error effects for various mask-making processes Eom,T.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,D.Y., Shin,C. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Study of rigorous effects and polarization on phase shifting masks through simulations and in-die phase measurements K. M. Lee, M. Tavassoli, M. Lau, K. Baik, B. Lieberman, S. Perlitz, U. Buttgereit, T. Scherubl SPIE - The International Society of Optical Engineering	8 Conference Proceedings Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry [6283-111] Lee, K., Yedur, S., Cheng, W., Tovassoli, M., Baik, K. SPIE - The International Society of Optical Engineering
3 Conference Proceedings CD and profile metrology of embedded phase shift masks using scatterometry [6281-46] Lee, M. K., Yedur, S., Hetzer, D., Tavassoli, M., Baik, K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Scatterometry measurement of nested lines, dual space, and rectangular contact CD on phase-shift masks K. M. Lee, S. Yedur, S. Henrichs, M. Tavassoli, K. Baik SPIE - The International Society of Optical Engineering
4 Conference Proceedings Automated creation of production metrology recipes based on design information J. P. Cain, M. Threefoot, K. Shah, B. Schulz, S. Girol- Gunia Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Deep subwavelength mask assist features and mask errors printability in high NA lithography [6349-189] Cheng, W.-H., Lee, M., Tolani, V., Nakahma, M., Gleason, B. SPIE - The International Society of Optical Engineering
5 Conference Proceedings CD metrology of binary and phase shift masks using scatterometry [5992-55] Lee, K. M., Yedur, S., Tabet, M., Tavassoli, M. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Optical properties of alternating phase-shifting masks [6349-46] Gleason, B., Cheng, W.-H. SPIE - The International Society of Optical Engineering
6 Conference Proceedings Phase metrology on 45-nm node phase-shift mask structures K. M. Lee, M. Tavassoli, U. Buttgereit, D. Seidel, R. Birkner Society of Photo-optical Instrumentation Engineers	12 Conference Proceedings Correcting lithography hot spots during physical-design implementation [6349-73] Luk-Pat, G. T., Miloslavsky, A., Ikeuchi, A., Suzuki, H., Kyoh, S., Izuha, K., Tseng, F., Wen, L. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12