Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20]
- Author(s):
Lucas, K. ( Freescale Semiconductor (France) ) Gordon, J. S. ( Toppan Photomasks, Inc. (USA) ) Conley, W. Saied, M. Warrick, S. ( Freescale Semiconductor (France) ) Pochkowski, M. Smith, M. D. ( KLA-Tencor (USA) ) West, C. Kalk, F. ( Toppan Photomask (USA) ) Kuijten, J. P. ( ASML (Netherlands) ) - Publication title:
- Photomask Technology 2006
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6349
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 63490K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- Language:
- English
- Call no.:
- P63600/6349
- Type:
- Conference Proceedings
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