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The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]

Author(s):
Ahn, W.-S.
Lee, H.-K.
Park, Y.-J.
Kwon, H.-J.
Choi, S.-W.
Han, W.-S. ( Samsung Electronics Co. (South Korea) )
1 more
Publication title:
Photomask Technology 2006
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6349
Pub. date:
2006
Pt.:
1
Page(from):
63490C
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
Language:
English
Call no.:
P63600/6349
Type:
Conference Proceedings

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