Optical lithography for nanotechnology (Invited Paper) [6327-15]
- Author(s):
- Flagello, D. G.
- Arnold, B. ( ASML US, Inc. (USA) )
- Publication title:
- Nanoengineering : fabrication, properties, optics, and devices III : 15-17 August, 2006, San Diego, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6327
- Pub. Year:
- 2006
- Page(from):
- 63270D
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464064 [0819464066]
- Language:
- English
- Call no.:
- P63600/6327
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE |
3
Conference Proceedings
Optical lithography into the millennium:sensitivity to aberrations,vibration,and polarization
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Understanding illumination effects for control of optical proximity effects (OPE)
Society of Photo-optical Instrumentation Engineers |
5
Conference Proceedings
Polarization effects associated with hyper-numerical aperture (NA>1) lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Layout optimization at the pinnacle of optical lithography (Invited Paper)
SPIE-The International Society for Optical Engineering |