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Dry etch technology development for NIL template [6283-87]

Author(s):
Yoshida, Y.
Amano, T.
Sasaki, S.
Itoh, K.
Toyama, N.
Mohri, H.
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
62833G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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