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Global pattern density control by resizing fill patterns for CD skew compensation [6283-80]

Author(s):
Shin, J.
Choi, J.
Park, S.
Lee, J.
Yoo, M.
Kong, J. ( Samsung Electronics Co., Ltd. (South Kores) )
1 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
628339
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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