Blank Cover Image

Mask specifications for 45-nm node: the impact of immersion lithography and polarized light imaging [6283-78]

Author(s):
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
628337
Page(to):
628338
Pages:
2
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings A novel strategy of lithography-error-budget optimization for the 65-nm node: mask specifications for hyper-NA imaging [5992-35]

Iwase, K., Ishikawa, K., Takeuchi, K., Ozawa, K., Uesawa, F.

SPIE - The International Society of Optical Engineering
7 Conference Proceedings Dry-etch proximity function for model-based OPC beyond 65-nm node [6155-03]

Sato, S., Ozawa, K., Uesawa, F.

SPIE - The International Society of Optical Engineering
2 Conference Proceedings A novel robust optimization method of exposure and mask conditions for beyond 65 nm-node lithography [5853-115]

Takeuchi, K., lwase, K., Ozawa, K., Uesawa, F.

SPIE - The International Society of Optical Engineering
8 Conference Proceedings Lithography of choice for the 45-nm node: new medium, new wavelength, or new beam?

Uesawa, F., Katsumata, M., Ogawa, K., Takeuchi, K., Omori, S., Yoshizawa, M., Kawahira, H.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Y. Kojima, M. Shirasaki, K. Chiba, T. Tanaka, Y. Inazuki, H. Yoshikawa, S. Okazaki, K. Iwase, K. Ishikawa, K. Ozawa

SPIE - The International Society of Optical Engineering
9 Conference Proceedings Water immersion optical lithography for 45-nm node

Smith, B.W., Kang, H., Bourov, A., Cropanese, F., Fan, Y.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

Hsu, M., Chen, F. J., Van Den Broeke, D., En Tszng, S., Shieh, J., Hsu, S., Shi, X.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Effect of azimuthally polarized illumination imaging on device patterns beyond 45-nm node [6154-12]

Ozawa, K., Thunnakart, B, Kaneguchi, T., Mita, I., Someya, A., Nakashima, T., Mizuno, Y., Matsuyama, T., Hamatani, M.

SPIE - The International Society of Optical Engineering
5 Conference Proceedings A new criterion of mask birefringence for polarized illumination [6349-194]

Iwase, K., Thunnakart, B., Kaneguchi, T., Ozawa, K., Yokoyama, T., Morikawa, Y., Uesawa, F.

SPIE - The International Society of Optical Engineering
11 Conference Proceedings Mask repair technique assessment and development for the 45 nm lithography node [6283-109]

Marchman, H., Taylor, D., Hadisutjipto, S., Mackay, S., Cottle, R., Maltabes, J., Brown, J.

SPIE - The International Society of Optical Engineering
6 Conference Proceedings Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

S. Mimotogi, F. Uesawa, M. Tominaga, H. Fujise, K. Sho, M. Katsumata, H. Hane, A. Ikegami, S. Nagahara, T. Ema, M. …

SPIE - The International Society of Optical Engineering
12 Conference Proceedings Enabling the 45nm node by hyper-NA polarized lithography [6154-11]

De Boeij, W., Swinkels, G, Le Masson, N., Koolen, A., Van Greevembroek, H., Klaassen, M., Van de Kerkhof, M., Van Ingen …

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12