Shot number estimation for EB direct writing for logic LSI utilizin character-build standard-cell layout technique [6283-56]

Shot number estimation for EB direct writing for logic LSI utilizin character-build standard-cell layout technique [6283-56]

Author(s):

Kajiya, Y.
Nakamura, A.
Yoshikawa, M.
Fujino, T. ( Ritsumeikan Univ. (Japan) )

Publication title:

Photomask and Next-Generation Lithography Mask Technology XIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6283

Pub. Year:

2006

Pt.:

2

Page(from):

62832M

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

Language:

English

Call no.:

P63600/6283

Type:

Conference Proceedings

Details

TDL ID:	ZA00016290
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2006 : 13th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2006.04.18-2006.04.20

Similar Items:

1 Conference Proceedings Character-build standard-cell layout technique for high-throughput character-projection EB lithography [5853-102] Fujino, T., Kajiya, Y., Yoshikawa, M. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Recent progress of a character projection-type low-energy electron-beam direct writing system K. Noguchi, K. Watanabe, H. Kinoshita, H. Shinozaki, Y. Kojima, S. Morita, F. Nakamura, N. Yamaguchi, K. Kushitani, T. … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing … Inanami, R., Magoshi, S., Kousai, S., Ando, A., Nakasugi, T., Mori, I., Sugihara, K., Miura, A. SPIE-The International Society for Optical Engineering	8 Conference Proceedings MELCO Standard@Small Satellite System H. Shimoji, S.Yoshikawa, K. Kodeki, M. Nakamura, T. Sasaki, T. Ozaki ESA Publications Division
3 Conference Proceedings Shot minimization for throughput improvement of character projection electron beam direct writing H. Pham Dinh Minh, T. lizuka, M. Ikeda, K. Asada Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings A character projection low energy electron beam direct writing system for device of small production lot with a variety of designs [6151-35] Nakamura, F., Watanabe, K., Kinoshita, H., Shinozaki, H., Kojima, Y., Morita, S., Noguchi, K., Yamaguchi, N., Isokawa, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Shot number analysis at 65-nm node mask writing using VSB writer Hirumi, J., Kuriyama, K., Yoshioka, N., Yoshikawa, R., Hojo, Y., Matuzaka, T., Tanaka, K., Hoga, M. SPIE-The International Society for Optical Engineering	10 Conference Proceedings 0.15-ｦﾌm pattern formation using cell projection electron-beam direct writing with variable shot size Tamura,T., Yamashita,H., Nakajima,K., Nozue,H. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Shot reduction technique for character projection lithography using combined cell stencil [5992-96] Kazama, T., Ikeda, M., Asada, K. SPIE - The International Society of Optical Engineering	11 Conference Proceedings Advances in Laser Direct Writing Bloomstein M. T., Palmacci T. S., Mathews H. R., Nassuphis N., Ehrilich J. D. Kluwer Academic Publishers
6 Conference Proceedings Shot number analysis on character projection e-beam lithography for random logic device fabrication at 70-nm node Tomo,Y., Shimizu,I., Kojima,Y., Yoshida,A., Takenaka,H., Yamabe,M. SPIE-The International Society for Optical Engineering	12 Conference Proceedings DIRECT WRITING OF CARBON INTERCONNECTIONS Lyons, A. M., Wilkins Jr., C. W., Mendenhall, F. T. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12