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Quartz etch challenges for 45 nm phase-shift masks [6283-28]

Author(s):
Anderson, A. S.
Chandrachood, M.
Grimbergen, M.
Leung, B. Y. T.
Ibrahim, I.
Panayil, S.
Kumar, A. ( Applied Materials Inc. (USA) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
2
Page(from):
62831X
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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