A study for effect of rounded contact hole pattern by laser mask writng machine onto wafer process margin [6283-15]

A study for effect of rounded contact hole pattern by laser mask writng machine onto wafer process margin [6283-15]

Author(s):

Park, -J. S.

Kim. K. ( Dongbu Electronics (South Korea) )

1 more

Publication title:

Photomask and Next-Generation Lithography Mask Technology XIII

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6283

Pub. Year:

2006

Pt.:

1

Page(from):

62831K

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

Language:

English

Call no.:

P63600/6283

Type:

Conference Proceedings

Details

TDL ID:	ZA00016290
Series ID:	PA00000029
Conf. info. (Name):	Photomask and next-generation lithography mask technology
Conf. info. (Number):	2006 : 13th
Conf. info. (Venue):	Yokohama, Japan
Conf. info. (Date):	2006.04.18-2006.04.20

Similar Items:

1 Conference Proceedings Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138] Park, S.J., Shim, Y.A., Kang, J.H., Choi,J Y, Yoon K H, Lee Y S, Kim K SPIE - The International Society of Optical Engineering	7 Conference Proceedings Fogging effect consideration in mask process at 50-KeV e-beam systems Yang, S.-H., Choi, Y.-H., Park, J.-R., Kim, Y.-H., Choi, S.-W., Yoon, H.-S., Sohn, J.-M. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Analysis of the effect of laser bandwidth on imaging of memory patterns N. Seong, I. Kim, D. Kang, S.-H. Lee, J. Choi Society of Photo-optical Instrumentation Engineers	8 Conference Proceedings TaN-based EUV mask absorber etch study [6283-84] Du, Y., Choi, J. C., Zhang, G., Park, -J. S., Yan, -Y. P., Baik, -H. K. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Study of the mask topography effect on the OPC modeling of hole patterns S. Shim, Y. Kim, S. Lee, S. Choi, W. Han Society of Photo-optical Instrumentation Engineers	9 Conference Proceedings Fulfillment of model-based OPC for contact patterns in 60-nm level logic device Kim, S.-W., Lee, S.-W., Park, C.-M., Choi, S.-H., Lee, Y.-M., Kang, Y., Yeo, G.-S., Lee, J.-H., Cho, H.-K., Han, W.-S. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Evaluation of litho printability of DRAM contact hole patterns with various programmed defects K. Seo, S. Lee, H. Kim, D. Hwang, S. Kim, G. Jeong, O. Han, C. Chen, D. Yee, E. Kim, K. Park, N. Kim, S. Choi, D. Kim, … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Simulation and experiments for inspection properties of EUV mask defects [6283-85] Park, J., Kim, -S. S., Lee, S., Woo, -G. S., Cho, -K. H., Moon, -T. J. SPIE - The International Society of Optical Engineering
5 Conference Proceedings The study of contact hole MEEF and defect printability Jeong, C.-Y., Lim, Y.H., Kim, H.I., Park, J.L., Choi, J.S., Lee, J.G. SPIE - The International Society of Optical Engineering	11 Conference Proceedings The study for close correlation of mask and wafer to optimize wafer field CD uniformity M. Kim, J. Kang, S. Kang, G. Jeong, Y. Choi Society of Photo-optical Instrumentation Engineers
6 Conference Proceedings Photomask dry-etching techniques for hard mask [6283-24] Kwon, -W. S., Park, -J. Y., Kim, -Y. S., Lee, H., Kwon, -J. H., Choi, -W. H., Han, -S. W. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Analysis of process margin in EUV mask repair with nano-machining S.-Y. Lee, G.-B. Kim, H.-S. Sim, S.-H. Lee, H. S. Kim Society of Photo-optical Instrumentation Engineers

1

2

3

4

5

6

7

8

9

10

11

12