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Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]

Author(s):
Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
Philipsen, V.
Leunissen, A. H. L.
Hendrickx, E.
Jonckheere, R.
Vandenberghe, G. ( IMEC (Belgium) )
Buttgereit, U.
Becker, H. ( Schott Lithotec AG (Germany) )
Koepernik, C.
Irmscher, M. ( Institut fur Mikroelektronik Stuttgart (Germany) )
5 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. date:
2006
Pt.:
1
Page(from):
62831G
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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