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Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]

Author(s):
Koepernik, C. ( IMS Chips (Germany) )
Becker, H. ( Schott Lithotec (Germany) )
Brikner, R. ( Carl Zeiss SMS GmbH (Germany) )
Buttgereit, U. ( Schott Lithotec (Germany) )
Irmscher, M.
Nedelmann, L. ( IMS Chips (Germany) )
Zibold, A. ( Carl Zeiss SMS GmbH (Germany) )
2 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
62831D
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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