A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117]
- Author(s):
Chen, T. Van Den Broeke, D. Tejnil, E. Hsu, S. Park, S. Berger, G. Coskun, T. De Vocht, J. Corcoran, N. Chen, F. J. ( ASML MaskTools (USA) ) van der Heijden, E. Finders, J. Engelen, A. ( ASML (Netherlands) ) Socha, R. ( ASML TDL (USA) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62831A
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
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