Novel mask inspection flow for better defect review and analysis [6283-107]
- Author(s):
Lim, K. Park, H. J. Chung, H. D. Choi, W. S. Han, S. W. ( Samsung Electronics Co., Ltd. (South Korea) ) Takizawa, H. Miyazaki, K. ( Lasertec Corp. (Japan) ) - Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62830Z
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability
Society of Photo-optical Instrumentation Engineers |
7
Conference Proceedings
Comparative evaluation of mask production CAR development processes with stepwise defect inspection
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
Conference Proceedings
The detectability of Qz phase defects and its application for 65 nm node CPL mask manufacturing [5992-05]
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
The characterization of line-width in mask using spectrophotometry [6283-51]
SPIE - The International Society of Optical Engineering |
4
Conference Proceedings
Simulation and experiments for inspection properties of EUV mask defects [6283-85]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
Conference Proceedings
EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95]
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Phase defect printability analysis for chromeless phase lithography technology
SPIE-The International Society for Optical Engineering |
6
Conference Proceedings
Implementation of reflected light die-to-die inspection and ReviewSmart to improve 65nm DRAM mask fabrication [5992-09]
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
Mask fabrication results using new laser writing system: Sigma7300 [6283-14]
SPIE - The International Society of Optical Engineering |