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Lithography process window enhancement using integrated design defect detection and fix [6283-100]

Author(s):
Su, B. ( KLA-Tencor Corp. (USA) )
Ma, M. ( Aprio Technologies, Inc. (USA) )
Vikram, A.
Volk, W.
Du, H.
Verma, G. ( KLA-Tencor Corp. (USA) )
Morse, R. ( Aprio Technologies, Inc. (USA) )
Chu, C.
Tsao, B.
Lin, C.
Chou, J.
Tsai, S. ( ProMOS Technologies Inc. (Taiwan) )
7 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
62830Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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