Optimization of TaSix absorber stack for EUV mask [6283-94]
- Author(s):
- Tamura, S.
- Kanayama, Y.
- Nishiyama, Y.
- Matsua, T.
- Tamura, A. ( Toppan Printing Co., Ltd. (Japan) )
- Publication title:
- Photomask and Next-Generation Lithography Mask Technology XIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6283
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 62830J
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- Language:
- English
- Call no.:
- P63600/6283
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
Conference Proceedings
Absorber stack optimization toward EUV lithography mask blank pilot production
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
Conference Proceedings
Effect of absorber material and mask pattern correction on pattern fidelity in EUV lithography
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Mask pattern correction to compensate for the effect of off-axis incidence in EUV lithography [6283-96]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
EUV absorbance and dry-etching characteristics of TaGeN films for EUVL mask absorber
SPIE - The International Society of Optical Engineering |