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EBM-5000: electron-beam mask writer for 45 nm node [6283-04]

Author(s):
Sunaoshi, H.
Tachikawa, Y.
Higurashi, H.
Iijima, T.
Suzuki, J.
Kamikubo, T.
Ohtoshi, K.
Anze, H.
Katsumata, T.
Nakayamada, N.
Hara, S.
Tamamushi, S.
Ogawa, Y. ( NuFlare Technology Onc. (Japan) )
8 more
Publication title:
Photomask and Next-Generation Lithography Mask Technology XIII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6283
Pub. Year:
2006
Pt.:
1
Page(from):
628306
Page(to):
628306
Pages:
1
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463586 [0819463582]
Language:
English
Call no.:
P63600/6283
Type:
Conference Proceedings

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