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Analysis method to determine and characterize the mask mean-to-target and uniformity specification [6281-55]

Author(s):
Lee, -W. S. ( Samsung Electronics (South Korea) )
Leunissen, A. H. L.
Van de Kerhove, J.
Philipsen, V.
Jonckheere, R. ( IMEC (Belgium) )
Lee, -J. S.
Woo, -G. S.
Cho, -K. H.
Moon, -T. J. ( Samsung Electronics (South Korea) )
4 more
Publication title:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6281
Pub. Year:
2006
Page(from):
62810U
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463562 [0819463566]
Language:
English
Call no.:
P63600/6281
Type:
Conference Proceedings

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