Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]

Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]

Author(s):

Konishi, T.

Kojima, Y.

Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) )

Philipsen, V.

Leunissen, A. H. L.

Van Look, L. ( IMEC vzw (Belgium) )

1 more

Publication title:

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6281

Pub. Year:

2006

Page(from):

62810S

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463562 [0819463566]

Language:

English

Call no.:

P63600/6281

Type:

Conference Proceedings

Details

TDL ID:	ZA00016288
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference
Conf. info. (Number):	2006 : 22nd
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2006.01.23-2001.01.26

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