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Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]

Author(s):
Konishi, T.
Kojima, Y.
Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) )
Philipsen, V.
Leunissen, A. H. L.
Van Look, L. ( IMEC vzw (Belgium) )
1 more
Publication title:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6281
Pub. Year:
2006
Page(from):
62810S
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463562 [0819463566]
Language:
English
Call no.:
P63600/6281
Type:
Conference Proceedings

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