Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
- Author(s):
Konishi, T. Kojima, Y. Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) ) Philipsen, V. Leunissen, A. H. L. Van Look, L. ( IMEC vzw (Belgium) ) - Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810S
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
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