The Performance of pasitive and negative CAR mask exposed by Leica 20 KeV writing system [6281-27]
- Author(s):
- Tseng, -R. C.
- Gan, -A. E.
- Lee, D.
- Wu, -H. C.
- Chen, -B. S. ( Taiwan Mask Corp. (Taiwan) )
- Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810L
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
Similar Items:
1
Conference Proceedings
Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system [6349-167]
SPIE - The International Society of Optical Engineering |
7
Conference Proceedings
Comparison between positive and negative 50-k eV E-beam CAR for 0.1-μm generation
SPIE-The International Society for Optical Engineering |
2
Conference Proceedings
Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
9
Conference Proceedings
Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test mask [6281-16]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
Conference Proceedings
Comparison between 2-phase-shifting mask and 3-phase-shifting mask on application of printing low-duty-ratio contact array patterning
SPIE - The International Society for Optical Engineering |
5
Conference Proceedings
Mask fabrication results using new laser writing system: Sigma7300 [6283-14]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
12
Conference Proceedings
Characteristics of negative-tone chemically amplified resist (MES-ENIG) for 50-keV EB mask writing system
SPIE-The International Society for Optical Engineering |