Advanced processes for photomask damage-free cleaning and photoresist removal [6281-26]
- Author(s):
Papanu, S. J. Gouk, R. Chen, -W. H. Boelen, P. Peters, P. Belisle, M. Verhaverbeke, S. Ko, A. Child, K. Martinez, E. ( Applied Materials (USA) ) - Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810K
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
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