Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]

Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]

Author(s):

Janssen, M.
van Ingen Schenau, K.
van der Laan, H. ( ASML Netherlands B.V. (Netherlands) )

Publication title:

EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6281

Pub. date:

2006

Page(from):

62810F

Pub. info.:

Bellingham, Wash.,: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463562 [0819463566]

Language:

English

Call no.:

P63600/6281

Type:

Conference Proceedings

Details

TDL ID:	ZA00016288
Series ID:	PA00000029
Conf. info. (Name):	European Mask and Lithography Conference
Conf. info. (Number):	2006 : 22nd
Conf. info. (Venue):	Dresden, Germany
Conf. info. (Date):	2006.01.23-2001.01.26

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