Improvement of OPC accuracy for 65nm node contact using KIF [6155-22]
- Author(s):
Wu, T. H. ( United Microelectronics Corp. (Taiwan) ) Lin, C. L. ( United Microelectronics Corp. (Taiwan) ) Chen, M. J. ( United Microelectronics Corp. (Taiwan) ) Tsai, Z. H. ( United Microelectronics Corp. (Taiwan) ) Ao, C. Y. ( United Microelectronics Corp. (Taiwan) ) Thung, H. C. ( United Microelectronics Corp. (Taiwan) ) Liou, J. S. ( United Microelectronics Corp. (Taiwan) ) Yang, C. H. ( United Microelectronics Corp. (Taiwan) ) Lin, L. C. ( United Microelectronics Corp. (Taiwan) ) - Publication title:
- Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6155
- Pub. Year:
- 2006
- Page(from):
- 61550M
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461988 [0819461989]
- Language:
- English
- Call no.:
- P63600/6155
- Type:
- Conference Proceedings
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