Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography [6155-08]

Author(s):

• Tay, A. ( National Univ. of Singapore (Singapore) )
• Ho, W. -K. ( National Univ. of Singapore (Singapore) )
• Hu, N. ( National Univ. of Singapore (Singapore) )
• Tsai, K.Y. ( National Taiwan Univ. (Taiwan) )
• Zhou, Y. ( Institute of Chemical and Engineering Sciences (Singapore) )

Publication title:

Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6155

Pub. Year:

2006

Page(from):

61550A

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461988 [0819461989]

Language:

English

Call no.:

P63600/6155

Type:

Conference Proceedings