Dry-etch proximity function for model-based OPC beyond 65-nm node [6155-03]

Dry-etch proximity function for model-based OPC beyond 65-nm node [6155-03]

Author(s):

Sato, S. ( Sony Corp. (Japan) )
Ozawa, K. ( Sony Corp. (Japan) )
Uesawa, F. ( Sony Corp. (Japan) )

Publication title:

Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6155

Pub. Year:

2006

Page(from):

615504

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461988 [0819461989]

Language:

English

Call no.:

P63600/6155

Type:

Conference Proceedings

Details

TDL ID:	ZA00016187
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Data Analysis and Modeling for Process Control
Conf. info. (Number):	2006 : 3rd
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.23

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