Wafer management between coat/developer track and immersion lithography tool [6154-177]

Author(s):

Fujiwara, T. ( Nikon Corp. (Japan) )

Shiraishi K ( Nikon Corp. (Japan) )

Tanizaki H ( Nikon Corp. (Japan) )

Ishii Y ( Nikon Corp. (Japan) )

Kyoda H ( Tokyo Electron Kyushu Ltd. (Japan) )

Yamamoto T ( Tokyo Electron Kyushu Ltd. (Japan) )

Ishida S ( Tokyo Electron Kyushu Ltd. (Japan) )

2 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

3

Page(from):

61544L

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings