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Verification of optical proximity effect in immersion lithography [6154-176]

Author(s):
Suganaga T ( Renesas Technology Corp (Japan) )
Maejima S ( Renesas Technology Corp (Japan) )
Hanawa T ( Renesas Technology Corp (Japan) )
Ishibashi T ( Renesas Technology Corp (Japan) )
Nakao S ( Renesas Technology Corp (Japan) )
Shirai S ( Renesas Technology Corp (Japan) )
Narimatsu K ( Renesas Technology Corp (Japan) )
Suko K ( Renesas Technology Corp (Japan) )
Shiraishi K ( Nikon Corp (Japan) )
Ishii Y ( Nikon Corp (Japan) )
Ando, T ( Tokyo Ohka Kogyo Co Ltd (Japan) )
Ohmori, K ( Tokyo Ohka Kogyo Co Ltd (Japan) )
7 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
61544K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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