Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]

Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]

Author(s):

Borjon, A. ( Philips Semiconductors (France), Freescale Semicondutor (France), LETI-CEA (France), STMicroelectronics (France), and LTM-CNRS, CEA Grenoble (France) )

Belledent, J. ( Philips Semiconductors (France) )

Trouiller, Y. ( LETI-CEA (France) )

Lucas, K. ( Fresscale Semicondutor (France) )

Couderc, C. ( Philips Semiconductors (France) )

Sundermann, F. ( STMicroelectronics (France) )

Urbani, J. C. ( STMicroelectronics (France) )

Rody, Y. ( Philips Semiconductors (France) )

Gardin, G. ( Freescale, Semicondutor (France) )

Foussadier, F. ( STMicroelectronics (France) )

Schiavone, P ( LTM-CNRS, CEA Grenoble (France) )

6 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

3

Page(from):

61544D

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings Through-process window resist modelling strategies for the 65 nm node [5992-46] Borjon, A., Belledent, J., Troullier, Y., Patterson, K., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. -C., Baron, … SPIE - The International Society of Optical Engineering	7 Conference Proceedings Sensitivity of a variable threshold model toward process and modeling parameters [6349-44] Saied, M., Foussadier, F., Trouiller, Y., Belledent, J., Lucas, K., Schanen, I., Borjon, A., Couderc, C., Gardin, C., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen, C. Gardin, J. C. Urbani, P. K. Montgomery, F. … SPIE - The International Society of Optical Engineering
3 Conference Proceedings OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes F. Sundermann, Y. Trouiller, J. Urbani, C. Couderc, J. Belledent, A. Borjon, F. Foussadier, C. Gardin, L. LeCam, Y. … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Characterization of inverse SRAF for active layer trenches on 45-nm node J. -C. Urbani, J. -D. Chapon, J. Belledent, A. Borjon, C. Couderc, J. -L. Di-Maria, V. Farys, F. Foussadier, C. Gardin, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Correction of long-range effects applied to the 65-nm node [5853-107] Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings 32-nm SOC printing with double patterning, regular design, and 1.2 NA immersion scanner Y. Trouiller, V. Farys, A. Borjon, J. Belledent, C. Couderc, F. Sundermann, J. Urbani, Y. Rody, C. Gardin, J. Planchot, … SPIE - The International Society of Optical Engineering
5 Conference Proceedings High accuracy 65nm OPC verification: full process window model vs. critical failure ORC Amandine Borjon, Jerome Belledent, Shumay D. Shang, Olivier Toublan, Corinne Miramond, Kyle Patterson, Kevin Lucas, … SPIE - The International Society of Optical Engineering	11 Conference Proceedings Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100] Couderc, C., Belledent, J., Borjon, A., Trouiller, Y., Sundermann, F., Lucas, K., Urbani, J.C., Foussadier, F., Rody, … SPIE - The International Society of Optical Engineering
6 Conference Proceedings 65nm OPC and design optimization by using simple electrical transistor simulation Trouiller, Y., Devoivre, T., Belledent, J., Foussadier, F., Borjon, A., Patterson, K., Lucas, K., Couderc, C., … SPIE - The International Society of Optical Engineering	12 Conference Proceedings Modeling of electromagnetic effects from mask topography at full-chip scale Borjon, A., Belledent, J., Shang, S. D., Toublan, O., Miramond, C., Patterson, K., Lucas, K., Couderc, C., Rody, Y., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12