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Mask substrate birefringence requirements for hyper-NA lithography [6154-159]

Author(s):
van de Kerkhof, M. ( ASML (Netherlands) )
de Boeij, W. ( ASML (Netherlands) )
Demarteau, M. ( ASML (Netherlands) )
Geh, B. ( Carl Zeiss (USA) and ASML-TDC (USA) )
Leunissen, L. H. A. ( IMEC (Belgium) )
Martin, P. ( Photronics, Inc. (USA) )
Cangemi, M. ( Photronics, Inc. (USA) )
2 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
615444
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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