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Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application [6154-155]

Author(s):
Kim, H. ( Hynix Semiconductor Inc. (South Korea) )
Ahn, Y. B. ( Hynix Semiconductor Inc. (South Korea) )
Kim, J. ( Hynix Semiconductor Inc. (South Korea) )
Kim, S. ( Hynix Semiconductor Inc. (South Korea) )
Park, D. ( Hynix Semiconductor Inc. (South Korea) )
Kim, Y. -S. ( Hynix Semiconductor Inc. (South Korea) )
1 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
615441
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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