Illumination conditions matching for critical layers manufacturing in a production context [6154-149]

Illumination conditions matching for critical layers manufacturing in a production context [6154-149]

Author(s):

Armellin, L. P. ( Altis Semiconductor (France) )

Torsy, A. ( Altis Semiconductor (France) )

Hernan, K. ( Altis Semiconductor (France) )

Kerrien, G. ( Altis Semiconductor (France) )

Guidet, J. ( Altis Semiconductor (France) )

Riopel, Y. ( Altis Semiconductor (France) )

Salvetat, V. ( Nikon Precision Europe GmbH (France) )

2 more

Publication title:

Optical Microlithography XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

6154

Pub. Year:

2006

Pt.:

3

Page(from):

61543V

Pub. info.:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

Language:

English

Call no.:

P63600/6154

Type:

Conference Proceedings

Details

TDL ID:	ZA00016186
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Optical Microlithography
Conf. info. (Number):	2006 : 19th
Conf. info. (Venue):	San Jose, CA, USA
Conf. info. (Date):	2006.02.21-2006.02.24

Similar Items:

1 Conference Proceedings DOF enhancement for contact holes by using Nikon’s CDP option and its introduction into production [6154-85] Armellin, L. P., Dureuil, V., Nuel, L., Salvetat, V., Meier, W., Kraft, A. SPIE - The International Society of Optical Engineering	7 Conference Proceedings Control of Germination and Early Development in Parasitic Angiosperms timko P. M., florea S. C., Riopel L. J. Plenum Press
2 Conference Proceedings EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53] Martin, P. M., Progler, C. J., Cangemi, M., Adam K, Bailey G, LaCour P SPIE - The International Society of Optical Engineering	8 Conference Proceedings Quantum efficiency of the XMM pn-CCD camera Hartmann,R., Hartner,G.D., Briel,U.C., Dennerl,K., Haberl,F., Struder,L., Trumper,J., Bihler,E., Kendziorra,E., … SPIE - The International Society for Optical Engineering
3 Conference Proceedings Flare effect of different shape of illumination apertures in 193-nm optical lithography system [6154-119] Yun Y. J, Moon H. L, Jeon H.-L, Kim J.-H, Kim k SPIE - The International Society of Optical Engineering	9 Conference Proceedings Characterization of inverse SRAF for active layer trenches on 45-nm node J. -C. Urbani, J. -D. Chapon, J. Belledent, A. Borjon, C. Couderc, J. -L. Di-Maria, V. Farys, F. Foussadier, C. Gardin, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings media+ project 2T3D2 MUSCLE: masks through user's supply chain: leadership by excellence A. Torsy Society of Photo-optical Instrumentation Engineers	10 Conference Proceedings Advanced Surface Preparation Development on a 300 mm Single Wafer Spin-on Platform G. Briend, P. Besson, T. Salvetat, O. Pollet Electrochemical Society
5 Conference Proceedings SAR images matching improvement in radargrammetric conditions Oller,G., Denise,L., Marthon,P., Rognant,L. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Evaluation of an advanced process control solution to detect wafer positioning issues within the hot and cold plate modules of a lithography track [6155-19] Guillaume, O., Bouchardy, M., Armellin, L.-P SPIE - The International Society of Optical Engineering
6 Conference Proceedings The on-chip guiding system of the wide-field infrared camera at CFHT [5881-10] Albert, L., Riopel, M., Teeple, D., Ward, J., Barrick, G. SPIE - The International Society of Optical Engineering	12 Conference Proceedings Enhancing productivity and sensitivity in mask production via a fast integrated T+R pattern inspection and STARlight-2 contamination inspection on critical … J. -P. Sier, E. H. Lu, K. Bhattacharyya, S. Chakravarty, M. Lang, H. Schmalfuss, J. Heumann, T. Schulmeyer SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12