Dual anti-reflection layers for ARC/hard-mask applications [6154-144]
- Author(s):
Huang, V. ( Macronix International Co.. Ltd. (Taiwan) ) Wu, T. S. ( Macronix International Co.. Ltd. (Taiwan) ) Yang, M. ( Macronix International Co.. Ltd. (Taiwan) ) Lin, F. ( Macronix International Co.. Ltd. (Taiwan) ) Yang, E. ( Macronix International Co.. Ltd. (Taiwan) ) Yang, T. H. ( Macronix International Co.. Ltd. (Taiwan) ) Chen, K. C. ( Macronix International Co.. Ltd. (Taiwan) ) Ku, J. ( Macronix International Co.. Ltd. (Taiwan) ) Lu, C. Y. ( Macronix International Co.. Ltd. (Taiwan) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 3
- Page(from):
- 61543Q
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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