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Dual anti-reflection layers for ARC/hard-mask applications [6154-144]

Author(s):
Huang, V. ( Macronix International Co.. Ltd. (Taiwan) )
Wu, T. S. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, M. ( Macronix International Co.. Ltd. (Taiwan) )
Lin, F. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, E. ( Macronix International Co.. Ltd. (Taiwan) )
Yang, T. H. ( Macronix International Co.. Ltd. (Taiwan) )
Chen, K. C. ( Macronix International Co.. Ltd. (Taiwan) )
Ku, J. ( Macronix International Co.. Ltd. (Taiwan) )
Lu, C. Y. ( Macronix International Co.. Ltd. (Taiwan) )
4 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
3
Page(from):
61543Q
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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