Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]
- Author(s):
Park, S.J. ( DongbuAnam Semiconductor (South Korea) ) Shim, Y.A. ( DongbuAnam Semiconductor (South Korea) ) Kang, J.H. ( DongbuAnam Semiconductor (South Korea) ) Choi,J Y ( DongbuAnam Semiconductor (South Korea) ) Yoon K H ( DongbuAnam Semiconductor (South Korea) ) Lee Y S ( DongbuAnam Semiconductor (South Korea) ) Kim K ( DongbuAnam Semiconductor (South Korea) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 3
- Page(from):
- 61543K
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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