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Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]

Author(s):
Park, S.J. ( DongbuAnam Semiconductor (South Korea) )
Shim, Y.A. ( DongbuAnam Semiconductor (South Korea) )
Kang, J.H. ( DongbuAnam Semiconductor (South Korea) )
Choi,J Y ( DongbuAnam Semiconductor (South Korea) )
Yoon K H ( DongbuAnam Semiconductor (South Korea) )
Lee Y S ( DongbuAnam Semiconductor (South Korea) )
Kim K ( DongbuAnam Semiconductor (South Korea) )
2 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
3
Page(from):
61543K
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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