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Model-based OPC for node random size contact hole with SRAF [6154-129]

Author(s):
Huang, C. W. ( NANYA Technology Corp. (Taiwan) )
Chang, Y. Y. ( NANYA Technology Corp. (Taiwan) )
Yeh, L. S. ( NANYA Technology Corp. (Taiwan) )
Liao, H. Y. ( Mentor Graphic Corp. (Taiwan) )
Shih, C. L. ( NANYA Technology Corp. (Taiwan) )
Lin, J. P. ( NANYA Technology Corp. (Taiwan) )
1 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
61543C
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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