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Effect of lens aberrations on OPC model accuracy for low kl lithography process [6154-116]

Author(s):
  • Ahn J. K ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Jeong C. Y ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Park J.-L ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Choi J.-S ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Lee J.-G ( MagnaChip Semiconductor Ltd. (South Korea) )
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. Year:
2006
Pt.:
3
Page(from):
615432
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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