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How to obtain accurate resist simulations in very low-kl era- [6154-107]

Author(s):
Chiou T. B ( Asml TDC Asia (Taiwan) )
Park C. H ( Hynix Semiconductor Inc. (South Korea) )
Choi, J. S ( Hynix Semiconductor Inc. (South Korea) )
Min Y.-H ( ASML TDC Asia (Taiwan) )
Hansen S ( ASML TDC USA (USA) )
Tseng S. E ( ASML TDC Asia (Taiwan) )
Chen A C ( ASML TDC Asia (Taiwan) )
Yim D ( Hynix Semiconductor Inc. (South Korea) )
3 more
Publication title:
Optical Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6154
Pub. date:
2006
Pt.:
2
Page(from):
61542V
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
Language:
English
Call no.:
P63600/6154
Type:
Conference Proceedings

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